Deposition Rate of GeXC1-X Films Prepared by Reactive Sputtering

Liu Zhengtang, Zhu Jingzhi, Song Jianquan, Zheng Xiulin

Journal of Materials Engineering ›› 1998, Vol. 0 ›› Issue (2) : 6-8.

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Journal of Materials Engineering ›› 1998, Vol. 0 ›› Issue (2) : 6-8.

Deposition Rate of GeXC1-X Films Prepared by Reactive Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 1998, 0(2): 6-8

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