Properties and Application of the Low-Temperature Plasma Multiple Technology Deposition Al2O3 Films

LIN Xi-gang, CHEN Shu-xin, MIAO Jing-wei, WEI Jian-jun

Journal of Materials Engineering ›› 1999, Vol. 0 ›› Issue (10) : 11-13.

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Journal of Materials Engineering ›› 1999, Vol. 0 ›› Issue (10) : 11-13.

Properties and Application of the Low-Temperature Plasma Multiple Technology Deposition Al2O3 Films

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 1999, 0(10): 11-13

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