The Effect of Ion Implantation on the Characteristics of Oxide Formation of Copper Thin Films

WANG Er-min, WANG Xiao-zhen, ZHAO Xin-qing

Journal of Materials Engineering ›› 2000, Vol. 0 ›› Issue (8) : 39-40,46.

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PDF(142 KB)
Journal of Materials Engineering ›› 2000, Vol. 0 ›› Issue (8) : 39-40,46.

The Effect of Ion Implantation on the Characteristics of Oxide Formation of Copper Thin Films

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2000, 0(8): 39-40,46

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