RF Magnetron Sputtering Process and Photoelectric Property of Al Doped ZnO Films

LIU Xin-yu, JIANG Min-hong, ZHOU Xiu-juan, CHEN Jun, WANG Zhong-min

Journal of Materials Engineering ›› 2008, Vol. 0 ›› Issue (10) : 215-218.

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Journal of Materials Engineering ›› 2008, Vol. 0 ›› Issue (10) : 215-218.

RF Magnetron Sputtering Process and Photoelectric Property of Al Doped ZnO Films

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2008, 0(10): 215-218

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