耐等离子刻蚀防护涂层：先进制备技术与关键材料研究进展
崔云龙, 杨大望, 张猛, 刘映月, 李媛媛, 冯新畅, 李志刚, 郭芳威
Recent development in protective coatings for plasma etching resistance: Advanced manufacturing methods and critical materials
CUI Yunlong, YANG Dawang, ZHANG Meng, LIU Yingyue, LI Yuanyuan, FENG Xinchang, LI Zhigang, GUO Fangwei
.
.
DOI: 10.11868/j.issn.1001-4381.2026.000192
