Effects of Hydroxyl Treatment on Atomic Resistance Property of Hexagonal Boron Nitride Film

Yu ZHANG, Feng HUANG, Jin-rui MA, Qiang LIU, Yu SUN

Journal of Materials Engineering ›› 2018, Vol. 46 ›› Issue (7) : 61-67.

PDF(4603 KB)
PDF(4603 KB)
Journal of Materials Engineering ›› 2018, Vol. 46 ›› Issue (7) : 61-67. DOI: 10.11868/j.issn.1001-4381.2017.001154
RESEARCH ARTICLE

Effects of Hydroxyl Treatment on Atomic Resistance Property of Hexagonal Boron Nitride Film

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2018, 46(7): 61-67 https://doi.org/10.11868/j.issn.1001-4381.2017.001154

References

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(4603 KB)

Accesses

Citation

Detail

Sections
Recommended

/