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材料工程  2013, Vol. 0 Issue (7): 35-39    DOI: 10.3969/j.issn.1001-4381.2013.07.007
  材料与工艺 本期目录 | 过刊浏览 | 高级检索 |
磁控溅射NbSiN复合膜的微结构和性能
喻利花, 苑彩云, 许俊华
江苏科技大学 江苏省先进焊接技术重点实验室, 江苏 镇江 212003
Microstructures and Mechanical Properties of Magnetron Sputtered NbSiN Composite Films
YU Li-hua, YUAN Cai-yun, XU Jun-hua
Key Laboratory of Advanced Welding Technology, Jiangsu University of Science and Technology, Zhenjiang 212003, Jiangsu, China
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摘要 用磁控溅射方法制备了一系列不同Si含量的NbSiN复合薄膜。采用色散能谱仪、X射线衍射仪、纳米压痕仪、高温摩擦磨损仪表征复合膜的成分、微结构、力学性能以及室温和高温摩擦磨损性能。实验结果表明:NbSiN复合膜中只存在面心立方NbN结构,且呈(200)择优取向;Si的加入使复合膜硬度得到提高,Si含量为20.29%(原子分数)时硬度达到最大值32.1GPa,随着Si含量的进一步增加,复合膜的硬度逐步降低。室温和高温摩擦磨损实验结果表明,在室温时,NbSiN复合膜的平均摩擦因数在0.60~0.68之间,波动不大;而在650℃时,随着Si含量的增加,复合膜的平均摩擦因数从0.57降至0.42;650℃时的平均摩擦因数低于室温下的平均摩擦因数与氧化物的生成有关。
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关键词 NbSiN磁控溅射微结构力学性能摩擦磨损性能    
Abstract:NbSiN nano-composite films with different Si content were fabricated by magnetron sputtering technique. The composition, microstructure, mechanical and tribological properties of the films were investigated by energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), nano-indentation, and high-temperature tribo-meter. The results show that the coatings exhibit fcc NbN structure with a (200) preferential orientation. With increasing of Si content, the hardness of NbSiN composite films increases gradually to a maximum value of 32.1GPa at Si content of 20.29% atom fraction and then decreases. The friction coefficients of NbSiN coatings range from 0.60 to 0.68 with different Si content at room-temperature, however decrease from 0.57 to 0.42 at 650℃. The mean friction coefficients at high temperature are lower than those at room temperature, which is attributed to the formation of oxides at high temperature.
Key wordsNbSiN    magnetron sputtering    microstructure    mechanical property    tribological property
收稿日期: 2012-04-05      出版日期: 2013-07-20
1:  TG174.44  
基金资助:

国家自然科学基金资助项目(51074080);江苏省自然科学基金资助项目(BK2008240)

通讯作者: 许俊华,教授,主要从事纳米科学与技术、薄膜材料物理和化学以及薄膜磁性材料等领域的研究工作,江苏镇江京口区梦溪路2号江苏科技大学(212003),E-mail:jhxu@just.edu.cn     E-mail: jhxu@just.edu.cn
作者简介: 喻利花(1964-),女,硕士,教授,主要从事超晶格薄膜制备、微结构和性能的研究工作,联系地址:江苏省镇江市京口区梦溪路2号江苏科技大学(212003),E-mail:lhyu6@yahoo.com
引用本文:   
喻利花, 苑彩云, 许俊华. 磁控溅射NbSiN复合膜的微结构和性能[J]. 材料工程, 2013, 0(7): 35-39.
YU Li-hua, YUAN Cai-yun, XU Jun-hua. Microstructures and Mechanical Properties of Magnetron Sputtered NbSiN Composite Films. Journal of Materials Engineering, 2013, 0(7): 35-39.
链接本文:  
http://jme.biam.ac.cn/CN/10.3969/j.issn.1001-4381.2013.07.007      或      http://jme.biam.ac.cn/CN/Y2013/V0/I7/35
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