化学沉积Ni-P及Ni-Cu-P合金镀层晶化行为的比较

于会生, 罗守福, 王永瑞

The Comparisons of the Crystallization Behaviors of Electroless Ni-P and Ni-Cu-P Deposits

YU Hui-sheng, LUO Shou-fu, WANG Yong-rui

材料工程 . 2002, (4): 19 -23 .