退火温度对Ge/SiO2多层膜的结构和光学性能的影响
彭洁, 李子全, 刘劲松, 蒋明, 许奇
Effect of Annealing Temperature on Structure and Optical Properties of Ge/SiO2 Multilayer Films
PENG Jie, LI Zi-quan, LIU Jing-song, JIANG Ming, XU Qi
材料工程
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2014, (9): 32
-38
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DOI: 10.11868/j.issn.1001-4381.2014.09.006
