反应溅射Ge<sub>X</sub>C<sub>1-X</sub>薄膜的沉积速率

反应溅射Ge_XC_1-X薄膜的沉积速率

刘正堂, 朱景芝, 宋建权, 郑修麟

Deposition Rate of Ge_XC_1-X Films Prepared by Reactive Sputtering

Liu Zhengtang, Zhu Jingzhi, Song Jianquan, Zheng Xiulin

材料工程 . 1998, (2): 6 -8 .