金刚石薄膜的表面金属化及与Ti薄膜的界面扩散反应的AES研究

郑斌, 朱永法, 姚文清, 王鹤泉, 曹立礼, 胡为民

Study of the Metallization and Interface Reaction between Diamond Film and Ti Layer by AES

Zheng Bin, Zhu Yongfa, Yao Wenqing, Wang Hequan, Cao Lili, Hu Weimin

材料工程 . 1998, (8): 16 -19 .